Gas-discharge ion sources for generating linear ion beams. Principle of operation - anode layer ion beam source. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carousel. Processes: sputtering of materials from dielectric and conductive targets; magnetron sputtering assistance; ion cleaning, etching; polishing; plasma-enhanced chemical vapor deposition (PECVD); surface modification.
|Beam shape||Hollow rectangular|
|Gas efficiency||9 mA/sccm|